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Nanomagnetics Facility
The Nanomagnetics Facility in the Stanford Center for
Magnetic Nanotechnology provides processing and chacterization capabilities for magnetic and
other novel materials. The
Nanomagnetics Facility includes:
·
A
“Cluster”
UHV
system for in situ vacuum
deposition of a variety of films from targets comprised of a dozen
different materials, with thickness control to the 0.1 nanometer level
(Figure 1). Novel
composite materials can be formed by co-deposition from multiple targets
or in the presence of a reactive gas, thus presenting a vast range of
combinatorial possibilities.
· Ion milling with 7" RF Source (Figure 2), a powerful tool for selectively removing a broad range of materials patterned substrates.
·
Obducat nanoimprint system, which has
demonstrated production of dense templates with features down to 30 nm
lateral dimensions.
·
Alternating Gradient Magnetometer (AGM), M-H
Loop Tracer (MESA from SHB Instruments), and Vibrating Sample
Magnetometer (VSM).
·
High frequency permeameter (Ryowa).
·
Kerr
microscope for magnetic domain imaging.
·
Three
custom-made probe stations for DC and high frequency applications
·
High resolution Atomic Force Microscopy (with
conducting tips capable of 0.1 pA current resolution) and Magnetic
Force Microscopy. · Perkin Elmer 4400 Deposition System (4 targets), Ion Tech Deposition System (1 target, dual beam, Figure 6), and a UHV chamber with 4 ion beam targets and 3 DC magnetron targets.
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Figure 1: Multichamber, multi-target, "cluster" UHV deposition.
Figure
2:
Ion milling system
Figure 3: Obducat nanoimprinter.
Figure 4: SEM of large field 50 nm features.
Figure 5: Kerr-effect microscope images of magnetic domains in CoFeHfO of various thicknesses (0.4, 0.8, and 4 um, respectively).
Figure 6: Ion Tech dual-beam deposition chamber. |
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